Publication

Evaluating the Effectiveness of Tethered Bis(urazolyl) Diradicals as Molecular Building Blocks for Dynamic Covalent Chemistry

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Last modified
  • 06/25/2025
Type of Material
Authors
    Gary W Breton, Berry College, Mount BerryKenneth L Martin, Berry College, Mount BerryJames Alexander Bowron, Berry College, Mount BerryJohn Bacsa, Emory University
Language
  • English
Date
  • 2023-07-07
Publisher
  • American Chemical Society
Publication Version
Copyright Statement
  • © 2023 The Authors.
License
Final Published Version (URL)
Title of Journal or Parent Work
Volume
  • 88
Issue
  • 13
Start Page
  • 9157
End Page
  • 9166
Grant/Funding Information
  • G.W.B. and K.L.M. thank Berry College for providing generous financial support for this project
Supplemental Material (URL)
Abstract
  • Dynamic covalent chemistry (DCvC) is a powerful means by which to rapidly prepare complex structures from simple molecular building blocks. Effective DCvC behavior is contingent upon the reversibility of covalent bond formation. Stabilized radical species, therefore, have been effectively used for these applications. In earlier work we demonstrated that properly substituted 1-arylurazolyl radicals showed promise as oxygen-insensitive heterocyclic N-centered radicals with a propensity for reversible bond formation. In this work we have synthesized several tethered bis(urazolyl) diradicals, varying by the type and length of connectivity between the urazole rings, and tested them for DCvC behavior. We have found that when the two aryl rings to which the urazolyl radical sites are attached are tethered by a chain of five or more carbons, equilibrium mixtures of monomeric and dimeric species are formed by N-N bond formation between two radical sites. DCvC behavior is observed that is sensitive to changes in temperature, concentration, and (to a lesser extent) solvent. In general, the dimer species is favored at lower temperatures and higher concentrations.
Author Notes
Keywords
Research Categories
  • Chemistry, Organic
  • Engineering, Materials Science

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